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Triphenylsulfonium, 2-hydroxybenzoate (1:1) CAS 345580-99-6
- Identification

- Properties

- Safety Data

- Specifications & Other Information

- Links

- Quick Inquiry

Identification

CAS Number

345580-99-6

Name

Triphenylsulfonium, 2-hydroxybenzoate (1:1)

Synonyms

Triphenylsulfonium, 2-hydroxybenzoate;Triphenylsulfonium salicylate

SMILES

C1=CC=C(C=C1)(C2=CC=CC=C2)C3=CC=CC=C3.C1=CC=C(C(=C1)C(=O)O)

StdInChI

InChI=1S/C18H15S.C7H6O3/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18;8-6-4-2-1-3-5(6)7(9)10/h1-15H;1-4,8H,(H,9,10)/q+1;/p-1

StdInChIKey

KKLIEUWPBXKNFS-UHFFFAOYSA-M

Molecular Formula

C25H20O3S

Molecular Weight

400.5

Properties

Appearance

White to off-white powder

Safety Data

RIDADR 

NONH for all modes of transport

Specifications and Other Information of Our Triphenylsulfonium, 2-hydroxybenzoate (1:1) CAS 345580-99-6

Identification Methods

HNMR, HPLC

Purity

99% min, 99.5% min

Total Heavy Metals Impurities

＜100ppb,＜50ppb

Shelf Life

2 years

Storage

Under room temperature away from light

Known Application

I. Core Function: Photoacid Generator (PAG)
This compound is a triphenylsulfonium salt-based photoacid generator (PAG). Under UV or deep-UV (DUV) irradiation:
It absorbs light and undergoes photolytic cleavage
Generates a strong acid
The generated acid can catalyze chemically amplified reactions or initiate subsequent cationic polymerization. It is a key functional additive in photoresist and cationic photopolymer curing systems.
II. Main Application Areas
1. Semiconductor Photoresists (Chemically Amplified Photoresists, CARs)
Applicable to:
i-line, KrF, and ArF lithography systems
High-resolution chemically amplified photoresists
Main functions:
Acid generation upon exposure
Catalyzes deprotection reactions
Amplifies exposure effects → improves resolution, sensitivity, and critical dimension / line edge roughness (CD/LER) control
Advantages of the ortho-hydroxybenzoate structure:
Provides good photosensitivity
Reduces acid diffusion, improving resolution
Works synergistically with the triphenylsulfonium cation → good thermal stability and stable photoresist performance
2. Cationic Photocuring Systems
Used in UV-induced cationic curing of epoxy resins and vinyl ether systems
UV irradiation → acid generation → initiates cationic ring-opening polymerization or crosslinking
Applications include:
UV-curable coatings and inks
Electronic encapsulation materials
Photo-patternable insulating layers (e.g., PSPI, PI)

Links

This product is developed by our R&D company WatsonChem Advanced Chemical Materials (https://www.watsonchem.com/).

Quick Inquiry

Fill out our inquiry form and one of our experts will be in touch with you shortly. https://www.watson-int.com/triphenylsulfonium-2-hydroxybenzoate-11-cas-345580-99-6/

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