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Triphenylsulfonium salt with 1-(tricyclodec-1-ylmethyl) 2,2-difluoro-2-sulfoacetate (1:1) CAS 1022939-88-3
- Identification

- Properties

- Safety Data

- Specifications & Other Information

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Identification

CAS Number

1022939-88-3

Name

Triphenylsulfonium salt with 1-(tricyclodec-1-ylmethyl) 2,2-difluoro-2-sulfoacetate (1:1)

Synonyms

triphenylsulfonium ((1-adamantyl)methoxycarbonyl)difluoromethanesulfonatetriphenylsulfonium (adamantane-1-ylmethyl)oxycarbonyldifluoromethanesulfonate

SMILES

C1C2CC3CC1CC(C2)(C3)COC(=O)C(F)(F)S(=O)(=O).C1=CC=C(C=C1)(C2=CC=CC=C2)C3=CC=CC=C3

StdInChI

InChI=1S/C18H15S.C13H18F2O5S/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18;14-13(15,21(17,18)19)11(16)20-7-12-4-8-1-9(5-12)3-10(2-8)6-12/h1-15H;8-10H,1-7H2,(H,17,18,19)/q+1;/p-1

StdInChIKey

OPUSNKQMMLRYMS-UHFFFAOYSA-M

Molecular Formula

C31H32F2O5S2

Molecular Weight

586.7

Properties

Appearance

White to off-white powder

Safety Data

RIDADR 

NONH for all modes of transport

Specifications and Other Information of Our Triphenylsulfonium salt with 1-(tricyclodec-1-ylmethyl) 2,2-difluoro-2-sulfoacetate (1:1) CAS 1022939-88-3

Identification Methods

HNMR, HPLC

Purity

99% min, 99.5% min

Total Heavy Metals Impurities

<100ppb,<50ppb

Shelf Life

2 years

Storage

Under room temperature away from light

Known Application

I. Core Function: Photoacid Generator (PAG)This compound is a triphenylsulfonium salt-based photoacid generator (PAG). Under UV or deep-UV (DUV) irradiation:It absorbs light and undergoes photolytic cleavageProduces a strong acid (difluoromethanesulfonic acid)The generated acid can catalyze chemically amplified reactions or initiate subsequent cationic polymerization. It is a key functional additive in photoresist and cationic photopolymer curing systems.II. Main Application Areas1.Semiconductor Photoresists (Chemically Amplified Photoresists, CARs)Applicable to:i-line, KrF, and ArF lithography systemsHigh-resolution chemically amplified photoresistsMain functions:Acid generation upon exposureCatalyzes deprotection reactionsAmplifies exposure effects → improves resolution, sensitivity, and critical dimension / line edge roughness (CD/LER) controlAdvantages of the adamantyl structure:Provides high thermal stabilityReduces acid diffusion → improves resolution and line edge roughnessEnhances optical performance and formulation stability of photoresists

- Cationic Photocuring SystemsUsed in UV-induced cationic curing of epoxy resins and vinyl ether materialsUV irradiation → acid generation → initiates cationic ring-opening polymerization or crosslinkingApplications include:UV-curable coatings and inksElectronic encapsulation materialsPhoto-patternable insulating layers (e.g., PSPI, PI)

Links

This product is developed by our R&D company WatsonChem Advanced Chemical Materials (https://www.watsonchem.com/).

Quick Inquiry

Fill out our inquiry form and one of our experts will be in touch with you shortly. https://www.watson-int.com/triphenylsulfonium-salt-with-1-tricyclo3-3-1-137dec-1-ylmethyl-22-difluoro-2-sulfoacetate-11-cas-1022939-88-3/

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