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Triphenylsulfonium (3-hydroxytricyclodecane-1-methoxycarbonyl)difluoromethane sulfonate CAS 912290-04-1
- Identification

- Properties

- Safety Data

- Specifications & Other Information

- Links

- Quick Inquiry

Identification

CAS Number

912290-04-1

Name

Triphenylsulfonium (3-hydroxytricyclodecane-1-methoxycarbonyl)difluoromethane sulfonate

Synonyms

Triphenylsulfonium (3-hydroxytricyclodecane-1-methoxycarbonyl)difluoromethane sulfonate

SMILES

C1C2CC3(CC1CC(C2)(C3)O)COC(=O)C(F)(F)S(=O)(=O).C1=CC=C(C=C1)(C2=CC=CC=C2)C3=CC=CC=C3

StdInChI

InChI=1S/C18H15S.C13H18F2O6S/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18;14-13(15,22(18,19)20)10(16)21-7-11-2-8-1-9(3-11)5-12(17,4-8)6-11/h1-15H;8-9,17H,1-7H2,(H,18,19,20)/q+1;/p-1

StdInChIKey

MMTQYTFKDNOQOV-UHFFFAOYSA-M

Molecular Formula

C31H32F2O6S2

Molecular Weight

602.7

Properties

Appearance

White to off-white powder

Safety Data

RIDADR 

NONH for all modes of transport

Specifications and Other Information of Our Triphenylsulfonium (3-hydroxytricyclodecane-1-methoxycarbonyl)difluoromethane sulfonate CAS 912290-04-1

Identification Methods

HNMR, HPLC

Purity

99% min, 99.5% min

Total Heavy Metals Impurities

＜100ppb,＜50ppb

Shelf Life

2 years

Storage

Under room temperature away from light

Known Application

I. Core Function: Photoacid Generator (PAG)This compound is a triphenylsulfonium salt-based photoacid generator (PAG). Under UV or deep-UV (DUV) irradiation:It absorbs light and undergoes photolytic cleavageProduces a strong acid (difluoromethanesulfonic acid)The generated acid can catalyze chemically amplified reactions or initiate subsequent cationic polymerization. It is a key functional additive in photoresist and cationic photopolymer curing systems.II. Main Application Areas1.Semiconductor Photoresists (Chemically Amplified Photoresists, CARs)Applicable to:i-line, KrF, and ArF lithography systemsHigh-resolution chemically amplified photoresistsMain functions:Acid generation upon exposureCatalyzes deprotection reactionsAmplifies exposure effects → improves resolution, sensitivity, and critical dimension / line edge roughness (CD/LER) controlAdvantages of the adamantyl structure:Provides high thermal stabilityReduces acid diffusion → improves resolution and line edge roughnessEnhances optical performance and formulation stability of photoresists

- Cationic Photocuring SystemsUsed in UV-induced cationic curing of epoxy resins and vinyl ether materialsUV irradiation → acid generation → initiates cationic ring-opening polymerization or crosslinkingApplications include:UV-curable coatings and inksElectronic encapsulation materialsPhoto-patternable insulating layers (e.g., PSPI, PI)

Links

This product is developed by our R&D company WatsonChem Advanced Chemical Materials (https://www.watsonchem.com/).

Quick Inquiry

Fill out our inquiry form and one of our experts will be in touch with you shortly. https://www.watson-int.com/triphenylsulfonium-3-hydroxytricyclo3-3-1-137decane-1-methoxycarbonyldifluoromethane-sulfonate-cas-912290-04-1/

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