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Sulfonium, phenyl]bis-, inner salt CAS 1465790-38-8
- Identification

- Properties

- Safety Data

- Specifications & Other Information

- Links

- Quick Inquiry

Identification

CAS Number

1465790-38-8

Name

Sulfonium, phenyl]bis-, inner salt

Synonyms

2-(4-(bis(4-(tert-butyl)phenyl)sulfonio)phenoxy)-1,1,3,3,3-pentafluoropropane-1-sulfonate;PAG388

SMILES

StdInChI

StdInChIKey

Molecular Formula

C29H31F5O4S2

Molecular Weight

602.68

Properties

Appearance

White to off-white powder

Safety Data

RIDADR 

NONH for all modes of transport

Specifications and Other Information of Our Sulfonium, phenyl]bis-, inner salt CAS 1465790-38-8

Identification Methods

HNMR, HPLC

Purity

99% min, 99.5% min

Total Heavy Metals Impurities

＜100ppb,＜50ppb

Shelf Life

2 years

Storage

Under room temperature away from light

Known Application

I. Core Function: Photoacid Generator (PAG)This compound is an aryl-triaryl sulfonium inner salt and serves as a cationic photoacid generator (PAG). Under UV or deep-UV (DUV) irradiation:It absorbs light and undergoes photolytic cleavageProduces a strong acid (e.g., difluoromethanesulfonic acid)The generated acid can catalyze chemically amplified reactions or initiate subsequent cationic polymerization. It is a key functional additive in photoresist and photopolymer curing systems.II. Main Application Areas

- Semiconductor Photoresists (Chemically Amplified Photoresists, CARs)Applicable to:i-line, KrF, and ArF lithography systemsHigh-resolution chemically amplified photoresistsMain functions:Acid generation upon exposureCatalyzes deprotection reactionsAmplifies exposure effects → improves resolution, sensitivity, and critical dimension / line edge roughness (CD/LER) controlStructural advantages:Difluoromethylsulfonyl and trifluoroethoxy groups → high acid strength, low diffusionAromatic and tert-butyl groups → improve thermal stability and solubilityInner salt structure → reduces migration and enhances optical performance in photoresists

- Cationic Photocuring SystemsUsed in UV-induced cationic curing of epoxy resins and vinyl ether systemsUV irradiation → acid generation → initiates cationic ring-opening polymerization or crosslinkingApplications include:UV-curable coatings and inksElectronic encapsulation materialsPhoto-patternable insulating layers (e.g., PSPI, PI)

Links

This product is developed by our R&D company WatsonChem Advanced Chemical Materials (https://www.watsonchem.com/).

Quick Inquiry

Fill out our inquiry form and one of our experts will be in touch with you shortly. https://www.watson-int.com/sulfonium-4-1-difluorosulfomethyl-222-trifluoroethoxyphenylbis4-11-dimethylethylphenyl-inner-salt-cas-1465790-38-8/

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