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Identification
CAS Number
75-24-1
Name
Trimethylaluminium
Synonyms
AlMe3Aluminum trimethanideAluminum, trimethyl- AV210LG46JBD2204000MFCD00008252 TMAtrimethyl aluminumTrimethylaluminium Trimethylaluminium Triméthylaluminium trimethylaluminum (CH3)3Al26628-81-9 4-04-00-04397 (Beilstein Handbook Reference) aluminium, trimethyl-Aluminum trimethylEINECS 200-853-0Trimethylalanetrimethylalumanetrimethyl-aluminumTrimethylaluminum, 2M in tolueneTrimethylaluminum, elec. gr.Trimethylaluminum, elec.gr.Trimethylaluminum,2.0M in hexaneTrimethylaluminummissingtrimetilalumínio UN 1103UNII:AV210LG46JUNII-AV210LG46J
SMILES
C(C)C
StdInChI
InChI=1S/3CH3.Al/h3*1H3;
StdInChIKey
JLTRXTDYQLMHGR-UHFFFAOYSA-N
Molecular Formula
C3H9Al
Molecular Weight
72.085
MDL Number
MFCD00008252
Properties
Safety Data
Symbol
GHS02,GHS05,GHS07,GHS08
Signal Word
Warning
Hazard statements
H225 - H250 - H260 - H304 - H314 - H336 - H361d - H373 - H412
Precautionary Statements
P210 - P231 + P232 - P280 - P301 + P330 + P331 - P303 + P361 + P353 - P304 + P340 + P310 - P305 + P351 + P338
WGK Germany
3
MSDS Download
Specifications and Other Information of Our
Identification Methods
Structure
Structure of Trimethylaluminium CAS 75-24-1
Known Application
Trimethylaluminum serves as a precursor material in the MOCVD method, used for depositing metal oxide films such as aluminum oxide. And In some organic synthesis reactions, trimethylaluminum is used as a precursor for catalysts, playing a role in catalyzing certain reactions.
Trimethylaluminum is a common precursor material used to deposit metal films, such as aluminum, aluminum alloys, or other metal oxide films, in semiconductor devices. These films play a crucial role in integrated circuits and other microelectronic devices.
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Links
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